Monday, May 19, 2008

Chemical Compound of the Day

Today is a huge day, as we are starting another new feature, Chemical Compound of the Day. We'll be honoring a different compound every day (or so), with the goal of revealing its true personality and inner beauty. Hopefully you can find one that you feel represents your inner soul. Today we'll start with Silicon Dioxide, SiO2. It's most interesting property is explained in the following excerpt: Silicon dioxide is attacked by hydrofluoric acid (HF). HF is used to remove or pattern silicon dioxide in the semiconductor industry. So... um...wait a minute... What the hell does that mean? You know what, forget it, screw this. This feature is gone.

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